Advancements in Plasma-Enhanced Chemical Vapor Deposition of Multi-Walled Carbon Nanotubes on Si/SiO2 Substrates: A Comprehensive Review
Keywords:
Plasma-enhanced chemical vapor deposition, Multi-walled carbon nanotubes, Si/SiO2 substrate, Nanoparticle catalysis, Growth mechanismAbstract
This review paper provides an in-depth exploration of the advancements in the field of plasma-enhanced chemical vapor deposition (PECVD) for the deposition of multi-walled carbon nanotubes (MWCNTs) on Si/SiO2 substrates. The study investigates the growth process of MWCNTs utilizing iron catalytic nanoparticles generated from the decomposition of Fe(CO)5. The deposition of iron oxide nanoparticles is accomplished through a microwave plasma torch with a dual-flow nozzle electrode, as previously described in the literature. The Si/SiO2 substrate is placed in a holder accommodating multiple samples, each with a deposition area of 4 × 4 mm. Argon serves as the carrier gas, with controlled flow rates through the central and outer channels. The deposition process is conducted for 15 seconds at a plasma power of 210 W. The resulting MWCNTs' structural characteristics, such as density, alignment, and uniformity, are examined. This comprehensive review highlights the intricate interplay of process parameters and their influence on MWCNT growth. The insights provided contribute to a better understanding of PECVD-based MWCNT synthesis and pave the way for optimizing these processes for various applications, including electronic and energy devices.
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